Professional On Oxygen And Nitrogen Gas Generation Solution.
PRODUCT DESCRIPTION
Zhongsu Hengda's high-purity nitrogen generator is a professional, tailored solution for semiconductor wafer fabrication. Integrating ultra-pure nitrogen output technology and precision flow control, it works as protective gas in silicon wafer cleaning lithography and etching—blocking air to avoid oxidation. Its consistent supply of high-grade nitrogen functions as carrier gas, conveys reaction gases, and prevents impurities from impairing chip performance. Built to be robust and accurate, it supports non-stop operation across diverse wafer processes, ensuring stable quality in semiconductor production while delivering reliable outcomes.
SHOW DETAILS
Product parameters
Purity |
95%-99.9995% |
N2 Capacity |
1-2000Nm3/h |
Discharge O2 Pressure |
0-5.5 Bar (Normal) |
O2 Dew Point |
-70℃ (Normal) |
Operation |
Full automatic |
PRODUCT INTRODUCTION
ADVANTAGES AND FEATURES
COMMON MODELS
Model |
Purity |
Capacity |
Model |
Purity |
Capacity |
Model |
Purity |
Capacity |
HDFD95-1 |
95% |
1 |
HDFD99-1 |
99% |
1 |
HDFD99.5-1 |
99.5% |
1 |
HDFD95-5 |
|
5 |
HDFD99-5 |
|
5 |
HDFD99.5-5 |
|
5 |
HDFD95-10 |
|
10 |
HDFD99-10 |
|
10 |
HDFD99.5-10 |
|
10 |
HDFD95-20 |
|
20 |
HDFD99-20 |
|
20 |
HDFD99.5-20 |
|
20 |
HDFD95-30 |
|
30 |
HDFD99-30 |
|
30 |
HDFD99.5-30 |
|
30 |
HDFD95-40 |
|
40 |
HDFD99-40 |
|
40 |
HDFD99.5-40 |
|
40 |
HDFD95-50 |
|
50 |
HDFD99-50 |
|
50 |
HDFD99.5-50 |
|
50 |
HDFD95-100 |
|
100 |
HDFD99-100 |
|
100 |
HDFD99.5-100 |
|
100 |
HDFD95-120 |
|
120 |
HDFD99-120 |
|
120 |
HDFD99.5-120 |
|
120 |
HDFD95-150 |
|
150 |
HDFD99-150 |
|
150 |
HDFD99.5-150 |
|
150 |
HDFD95-200 |
|
200 |
HDFD99-200 |
|
200 |
HDFD99.5-200 |
|
200 |
HDFD95-500 |
|
500 |
HDFD99-500 |
|
500 |
HDFD99.5-500 |
|
500 |
HDFD95-800 |
|
800 |
HDFD99-800 |
|
800 |
HDFD99.5-800 |
|
800 |
HDFD95-1000 |
|
1000 |
HDFD99-1000 |
|
1000 |
HDFD99.5-1000 |
|
1000 |
HDFD95-2000 |
|
2000 |
HDFD99-2000 |
|
2000 |
HDFD99.5-2000 |
|
2000 |
HDFD99.9-1 |
99.9% |
1 |
HDFD99 99-1 |
99.9% |
1 |
HDFD99.999-1 |
99.999% |
1 |
HDFD99.9-5 |
|
5 |
HDFD99.99-5 |
|
5 |
HDFD99.999-5 |
|
5 |
HDFD99.9-10 |
|
10 |
HDFD99.99-10 |
|
10 |
HDFD99.999-10 |
|
10 |
HDFD99.9-20 |
|
20 |
HDFD99.99-20 |
|
20 |
HDFD99.999-20 |
|
20 |
HDFD99.9-30 |
|
30 |
HDFD99.99-30 |
|
30 |
HDFD99.999-30 |
|
30 |
HDFD99.9-40 |
|
40 |
HDFD99.99-40 |
|
40 |
HDFD99.999-40 |
|
40 |
HDFD99.9-50 |
|
50 |
HDFD99.99-50 |
|
50 |
HDFD99.999-50 |
|
50 |
HDFD99.9-100 |
|
100 |
HDFD99.99-1.00 |
|
100 |
HDFD99.999-100 |
|
100 |
HDFD99.9-120 |
|
120 |
HDFD99.99-120 |
|
120 |
HDFD99.999-120 |
|
120 |
HDFD99.9-150 |
|
150 |
HDFD99.99-150 |
|
150 |
HDFD99.999-150 |
|
150 |
HDFD99.9-200 |
|
200 |
HDFD99.99-200 |
|
200 |
HDFD99.999-200 |
|
200 |
HDFD99.9-500 |
|
500 |
HDFD99.99-500 |
|
500 |
HDFD99.999-500 |
|
500 |
HDFD99.9-800 |
|
800 |
HDFD99.99-800 |
|
800 |
HDFD99.999-800 |
|
800 |
HDFD99.9-1000 |
|
1000 |
HDFD99.99-1000 |
|
1000 |
HDFD99.999-1000 |
|
1000 |
HDFD99.9-2000 |
|
2000 |
HDFD99.99-2000 |
|
2000 |
HDFD99.999-2000 |
|
2000 |
USER EVALUATE
FAQ
The target market of our brand has been continuously developed over the years. For more information, please reach our team, we are more than happy to help.
1) O2/N2/H2 Flow rate: ____Nm3/h
2) O2/N2/H2 Purity: ____%
3) O2/N2/H2 Discharge pressure: ____Bar
4) Voltages and Frequency: _____V/PH/HZ
5) Application or use for which industry.
We will recommend the most suitable equipment for you according to your needs.